Shot Noise Modeling in Metal-Oxide-Semiconductor Field Effect Transistors under Sub-Threshold Condition

We have developed a new simulation methodology for predicting shot noise intensity in Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET).In our approach, shot noise in MOSFETs is calculated by employing the two dimensional device simulator MEDICI in conjunction with the shot noise model of p-n junction.The accuracy of the noise model has been demonstrated by comparing simulation results with measured noise data of p-n diodes.The intensity of shot noise in various n-MOSFET devices under various bias conditions was estimated beyond GHz operational frequency by using our simulation scheme.At DC or lowfrequency region, sub-threshold current dominates the intensity of shot noise.Therefore, shot noise is independent on frequency in this region and its intensity is exponentially depends on V G , proportional to L -1 , and almost independent on V D .At highfrequency region above GHz frequency, on the other hand, shot noise intensity is frequency dependent and is quite larger than that of low-frequency region.In particular, the intensity of the RF shot noise is almost independent on L, V D and V G .This suggests that high-frequency shot noise intensity is decided only by the conditions of source-bulk junction.