等离子体处理
化学工程
沉积(地质)
原子层沉积
基质(水族馆)
物理气相沉积
碳膜
等离子体
光电子学
作者
Milana Vasudev,Kyle D. Anderson,Timothy J. Bunning,Vladimir V. Tsukruk,Rajesh R. Naik
摘要
Chemical vapor deposition (CVD) has been used historically for the fabrication of thin films composed of inorganic materials. But the advent of specialized techniques such as plasma-enhanced chemical vapor deposition (PECVD) has extended this deposition technique to various monomers. More specifically, the deposition of polymers of responsive materials, biocompatible polymers, and biomaterials has made PECVD attractive for the integration of biotic and abiotic systems. This review focuses on the mechanisms of thin-film growth using low-pressure PECVD and current applications of classic PECVD thin films of organic and inorganic materials in biological environments. The last part of the review explores the novel application of low-pressure PECVD in the deposition of biological materials.
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