钻石
材料科学
钝化
微晶
Atom(片上系统)
粗糙度(岩土工程)
摩擦学
硅
原子探针
纳米尺度
金刚石材料性能
纳米技术
复合材料
化学物理
光电子学
结晶学
微观结构
图层(电子)
化学
计算机科学
嵌入式系统
作者
Cyrian Leriche,Enrico Pedretti,O. Şahin,Dong‐Ho Kang,Maria Clelia Righi,Bart Weber
标识
DOI:10.1021/acsami.5c08647
摘要
Despite its supreme hardness, (synthetic) diamond wears. Due to the small volume loss involved, diamond wear is challenging to quantify, specifically for multicontact interfaces. Consequently, identifying which wear mechanisms dominate the degradation of macroscopically loaded diamond interfaces has remained an open challenge. Using a topography difference method based on atomic force microscopy imaging, we observe the wear of multi-asperity microcrystalline diamond (MCD) surfaces sliding nonrepeatedly against silicon nitride (Si3N4)-coated silicon wafers. By examining the wear scars on Si3N4, which can be seen as footprints of the MCD surface, we are uniquely able to track the nanoscale wear of individual MCD crystallites. Our MCD wear measurements show that the diamond wears atom-by-atom and that this wear is accelerated in the absence of passivation species in the environment. This conclusion is confirmed by ab initio molecular dynamics simulations, highlighting how diamond surface passivation suppresses interfacial bonding. Our results thus demonstrate that atom-by-atom wear occurs even in realistic, multi-asperity diamond contacts and that environmental passivation provides a practical and effective means to control interfacial degradation in advanced tribological systems.
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