Machine learning and eXplainable-AI based prediction of gate-all-around ferroelectric-FET: How ML models influence XAI

计算机科学 稳健性(进化) 神经形态工程学 人工智能 场效应晶体管 晶体管 机器学习 材料科学 计算机工程 算法 人工神经网络 电气工程 工程类 化学 基因 生物化学 电压
作者
Shailendra Yadav,N. Giri,Ashish Maurya,Brajesh Kumar Kaushik,Amita Giri
出处
期刊:Physica Scripta [IOP Publishing]
被引量:1
标识
DOI:10.1088/1402-4896/adc499
摘要

Abstract A novel integration of machine learning (ML) and eXplainable artificial intelligence (XAI) based prediction is proposed to investigate the variability of nanowire (NW) gate-all-around (GAA) ferroelectric-field effect transistors (Fe-FETs). XAI methods such as local interpretable model-agnostic explanations (LIME) and shapley additive explanations (SHAP) enhance the explainability and robustness of ML algorithms for end-users. The NW-GAA-ferro-FETs show tremendous potential for neuromorphic computing systems and compatibility with complementary-metal-oxide-semiconductor technology. The GAA-ferro-FET model is validated using sentaurus technology computer-aided design simulations and experimental data. In this work, the first-ever ML algorithms for NW-GAA-ferro-FETs are proposed, achieving physics-based TCAD accuracy with faster learning and lower computational cost. Compared to ML-based algorithms, physics-based simulation of conventional emerging devices requires a high level of device information and a substantial amount of time to provide correct findings and well-fit models. The ML algorithm achieved a R2-score of 99.96%, a lower mean square error, and completed the average inference in just 71.82 milliseconds, compared to TCAD simulations that would take 400 hours (=17 days) to process 5000 samples. The results indicate that the novel integration of ML and XAI can lead to a substantial reduction in the computational cost associated with various emerging FET devices, such as ferro-FET, feedback FET, tunnel FET, 2D material-based FET, spin-FET, bio-FET, and other next-generation FETs. End-users can receive suggestions and warnings about potential errors before initiating the investigation process, this helps speed up the development of ferro-FET and other next-generation FETs for use in aerospace, defence, and space exploration.

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