Universal and Nondestructive Direct Photolithography of Colloidal Quantum Dots Using Photocrosslinkable Polymer Blends (Adv. Funct. Mater. 10/2026)

Direct Photolithography In their Research Article (10.1002/adfm.202520047), Jaehoon Lim, Do-Hoon Hwang, Jeongkyun Roh, and co-workers present a universal and nondestructive direct photolithography method that enables high-resolution quantum dot (QD) patterning without ligand exchange. By blending QDs with a photocrosslinkable polymer, this approach preserves optical properties while enhancing QD-LED efficiency and operational lifetime, paving the way for next-generation display technologies.