钝化
降级(电信)
硅
材料科学
光电子学
化学工程
图层(电子)
纳米技术
电子工程
工程类
作者
Aditya R. Ratnapagol,William Nemeth,Chun‐Sheng Jiang,Sumit Agarwal,Paul Stradins,David L. Young
出处
期刊:Conference record of the ... IEEE Photovoltaic Specialists Conference
[Institute of Electrical and Electronics Engineers]
日期:2024-06-09
卷期号:: 1027-1027
被引量:2
标识
DOI:10.1109/pvsc57443.2024.10749336
摘要
Poly-Si/SiOx passivating contact silicon solar cells have reached very high efficiencies. The PV industry is rapidly moving from the conventional passivated emitter and rear contact cell (PERC) to the Tunnel oxide passivating contact cells (TOPCon). With the remarkable efficiencies and market share shift, the imperative now moves towards determining the long-term stability of passivating contacts cells including both polarities of the poly-Si/SiOx contacts. Several studies have identified a low temperature degradation/regeneration mode in n+ poly-Si contacts post firing. In this work we investigate the underlying factors contributing to the degradation of both n+ and p+ poly-Si/SiOx passivating contacts for n-type Cz silicon solar cell, by exploring the hypothesis that the degradation is caused by the formation of pinholes in the tunneling oxide layer.
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