High Isolation Voltage Auxiliary Power Supply Method With Diode-Capacitor Network (DCN) for Nanosecond Pulse Power Supply

The pulse parameter-editable nanosecond pulse power supply (NPPS) based on all-solid-state Marx power topology is one of the critical excitation sources for studying the characteristics of atmospheric pressure low-temperature plasma, its efficient applications, and the regulation of discharge characteristic. As the application fields of discharge plasma expand, the requirements for the pulse voltage amplitude output by NPPS also increase. However, achieving higher pulse voltage amplitudes in a solid-state Marx pulse generator circuit necessitates more Marx units in series and demands higher isolation voltage capabilities for the low-voltage auxiliary source control circuit. This article proposes a novel diode-capacitor network (DCN) auxiliary power supply method to address the critical challenge of high-voltage isolation in solid-state Marx-based NPPS. This article analyzes the variations in potential differences of the auxiliary power supply circuit under different operating modes of the Marx generator, including the pulse edge parameters (rise/fall edges) and the editing control method for the NPPS. It proposes the DCN auxiliary power supply method based on commercially available isolated dc–dc modules with standard voltage ratings, which not only effectively addresses the isolation and voltage withstand issues of the auxiliary source but also ensures higher power supply quality and improved interference resistance for control signals. We have developed a 20 kV/400 W NPPS with editable pulse edge parameters to validate the effectiveness of the DCN method. By applying this power supply to drive three typical plasma electrode discharges, experiments demonstrated that the DCN method significantly enhances the power supply's isolation performance and driving efficiency. Compared to traditional microsecond pulse methods, the NPPS performs better in plasma discharge applications, particularly in improving discharge efficiency and controlling plasma characteristics.