抛光
材料科学
钻石
蚀刻(微加工)
脆性
离子束
化学机械平面化
单晶
复合材料
离子
化学
结晶学
图层(电子)
有机化学
作者
Sichen Mi,Adrien Toros,Teodoro Graziosi,Niels Quack
标识
DOI:10.1016/j.diamond.2019.01.007
摘要
We propose a non-contact surface finishing method for brittle substrates by ion beam etching and we experimentally demonstrate polishing of (100) single crystal diamond surface. We model and simulate the polishing process, and verify the results experimentally by monitoring individual defects during the surface treatment. Rapid flattening of scratches and digs, as typically present on brittle substrates after mechanical polishing, is observed: trench depth is typically removed by 95% in less than 30 min. The polishing method relies on physical bombardment of the substrate surface with accelerated inert gas ions, rendering it highly versatile and applicable to a wide variety of materials.
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