材料科学
光学
光热治疗
光学涂层
偏转(物理)
光热光谱学
光电子学
薄膜
纳米技术
物理
作者
Laurent Gallais,Mireille Commandre
出处
期刊:Applied optics
[The Optical Society]
日期:2005-09-01
卷期号:44 (25): 5230-5230
被引量:20
摘要
A model of the photothermal deflection signal in multilayer coatings is presented that takes into account optical interference effects and heat flow within the stack. Measurements are then taken of high-reflectivity HfO2/SiO2 ultraviolet mirrors made by plasma ion assisted deposition and compared to calculations. Good agreement is found between the experimental results and the model. Using this model for the calibration and the setup described, one can measure absorption in multilayer coatings accurately down to 10(-7) of the incident power.
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