MOSFET
线性化
背景(考古学)
电子工程
计算机科学
半导体器件建模
曲面(拓扑)
工程类
物理
工程物理
电气工程
电压
CMOS芯片
晶体管
非线性系统
数学
几何学
古生物学
量子力学
生物
作者
G. Gildenblat,Xiaoyue Li,Weimin Wu,Hai Wang,Amit Jha,R. van Langevelde,G.D.J. Smit,A.J. Scholten,D.B.M. Klaassen
标识
DOI:10.1109/ted.2005.881006
摘要
This paper describes the latest and most advanced surface-potential-based model jointly developed by The Pennsylvania State University and Philips. Specific topics include model structure, mobility and velocity saturation description, further development and verification of symmetric linearization method, recent advances in the computational techniques for the surface potential, modeling of gate tunneling current, inclusion of the retrograde impurity profile, and noise sources. The emphasis of this paper is on incorporating the recent advances in MOS device physics and modeling within the compact modeling context
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