Refined heat conduction equation of thermomagnetic microtemperature semiconductor material during photothermal excitation process

In this problem, the coupled between magnetic field and thermal-elastic-plasma waves is studied. The governing equations are taken during photothermal excitation on a surface of semiconductor medium. The medium is exposed to weak external magnetic field during the refined multi-phase-lags of thermal relaxation times. The microelements (microtemperatures) possess due to microstructure of the semiconductor medium is investigated. The normal mode method is applied in one dimension (semiconductor rod) to obtain the main physical fields in this phenomenon for this microtemperature field. The surface is shocked by heating (thermal shock problem) and applying the free traction on its outer surface (mechanical boundary) through transport (diffusion) process of temperature to observe the analytical complete expressions of the main physical fields. The silicon (Si) material is used to make a simulation and obtain the numerical results. The basic physical field quantities are graphed and discussed.