扫描隧道显微镜
X射线光电子能谱
单层
费米能级
双层
密度泛函理论
紫外光电子能谱
低能电子衍射
化学
光谱学
光电发射光谱学
扫描隧道光谱
材料科学
凝聚态物理
分子物理学
电子衍射
电子结构
电子
衍射
纳米技术
计算化学
核磁共振
光学
物理
生物化学
量子力学
膜
作者
Kuanysh Zhussupbekov,Killian Walshe,Brian Walls,A. N. Ionov,S. I. Bozhko,A. S. Ksenz,Rais N. Mozhchil,Ainur Zhussupbekova,K. Fleischer,Samuel Berman,I. N. Zhilyaev,David D. O’Regan,I. V. Shvets
标识
DOI:10.1021/acs.jpcc.0c07345
摘要
Defects introduced to the surface of Bi(111) break the translational symmetry and modify the surface states locally. We present a theoretical and experimental study of the 2D defects on the surface of Bi(111) and the states that they induce. Bi crystals cleaved in ultrahigh vacuum (UHV) at low temperature (110 K) and the resulting ion-etched surface are investigated by low-energy electron diffraction (LEED), X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy (UPS), and scanning tunneling microscopy (STM) as well as spectroscopy (STS) techniques in combination with density functional theory (DFT) calculations. STS measurements of cleaved Bi(111) reveal that a commonly observed bilayer step edge has a lower density of states (DOS) around the Fermi level as compared to the atomic-flat terrace. Following ion bombardment, the Bi(111) surface reveals anomalous behavior at both 110 and 300 K: Surface periodicity is observed by LEED, and a significant increase in the number of bilayer step edges and energetically unfavorable monolayer steps is observed by STM. It is suggested that the newly exposed monolayer steps and the type A bilayer step edges result in an increase to the surface Fermi density as evidenced by UPS measurements and the Kohn-Sham DOS. These states appear to be thermodynamically stable under UHV conditions.
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