聚酰亚胺
光敏性
材料科学
紫外线
二苯甲酮
辐照
光电子学
光引发剂
紫外线
氧化物
光学
光化学
紫外线照射
热的
紫外线辐射
兴奋剂
高分子化学
光致聚合物
可见光谱
热致变色
氧化膦
酮
热稳定性
光刻
作者
Chuankai Zhou,Ying Yang,Xiaochuan Xi,Pei Cheng,Feng Ge,Yinghan Wang,Jiayu Wang
标识
DOI:10.1021/acsapm.6c00248
摘要
In order to improve the photosensitivity of OD-HAB6-CA polyimide alignment film and reduce the irradiation time under nonpolarized ultraviolet light (NPUVL), three types of photoinitiators, benzophenone (BP), 1-hydroxycyclohexyl phenyl ketone (184), and 2,4,6-trimethylbenzoyl-diphenyl phosphine oxide (TPO), are doped into the OD-HAB6-CA film. The results show that when the irradiation time and addition amount are the same, the photosensitivity of the OD-HAB6-CA alignment film containing 184 is higher than that of the other two. When the content of 184 is 1 mol equivalent of OD-HAB6-CA, the OD-HAB6-CA alignment film can induce the uniform alignment of liquid crystals (LCs) after only 4 min of NPUVL exposure. In addition, after the addition of photoinitiators, the alignment films still had good surface properties and thermal stability. Furthermore, the pretilt angle of the LC cells does not change after the addition of photoinitiators, and it remains at about 0.5°.
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