Effects of Wafer Emissivity on Rapid Thermal Processing Temperature Measurement

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation D. H. Chen, D. P. DeWitt, B. K. Tsai, K. G. Kreider, W. A. Kimes; Effects of Wafer Emissivity on Rapid Thermal Processing Temperature Measurement. AIP Conf. Proc. 29 September 2003; 684 (1): 735–740. https://doi.org/10.1063/1.1627215 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioAIP Conference Proceedings Search Advanced Search |Citation Search