光电阴极
光电流
材料科学
异质结
涂层
退火(玻璃)
电极
光电子学
分析化学(期刊)
化学工程
纳米技术
化学
复合材料
物理
物理化学
量子力学
工程类
电子
色谱法
作者
Hoang V. Le,Thuy Dieu Thi Ung,Phong D. Tran,Hoang Nguyen Van,Danh Bich,Nguyen Quang Liem
标识
DOI:10.1088/1361-6463/acefe1
摘要
Abstract This article presents a novel approach to improve both the photoelectrocatalytic activity and stability of the p-Cu 2 O photocathode. The approach involves the coating of an n-type TiO 2 layer using e-beam evaporation with precise controllability of the coating thickness onto the p-type Cu 2 O electrode, forming a TiO 2 /Cu 2 O p/n heterojunction. Such a p/n junction enhances the photoelectrocatalytic activity of the Cu 2 O electrode by promoting the separation of the photo-generated charge carriers. Additionally, the large bandgap TiO 2 coating layer serves as protection, reducing the photocorrosion of Cu 2 O, thereby improving the stability of the electrode. The n-TiO 2 /p-Cu 2 O photocathode shows superior photoelectrochemical H 2 evolution activity in comparison to the pristine p-Cu 2 O photocathode. We have found that the thickness and annealing temperature of TiO 2 influence strongly the photocurrent and stability of the resultant TiO 2 /Cu 2 O photocathode. The best TiO 2 /Cu 2 O photocathode was achieved by coating a 50 nm thick TiO 2 layer onto the Cu 2 O, followed by annealing at 350 °C. This configuration exhibited a large onset photovoltage of 0.58 V vs RHE and a catalytic current density of ∼0.9 mA·cm ‒2 at 0 V vs RHE in a pH 7 phosphate buffer, under standard 1 Sunlight illumination.
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