单层
还原(数学)
结晶学
材料科学
化学
矿物学
纳米技术
几何学
数学
作者
S. Surnev,Jacek Goniakowski,Malihe Mohammadi,Claudine Noguera,F. P. Netzer
出处
期刊:Surface Science
[Elsevier BV]
日期:2024-08-22
卷期号:750: 122579-122579
被引量:4
标识
DOI:10.1016/j.susc.2024.122579
摘要
The atomic structure of MoOx films formed upon a gradual thermal reduction of an ordered MoO3 monolayer on the Pd(100) substrate was explored via surface science characterization techniques and density functional theory (DFT) calculations. Two main reduction stages were identified. First, the initial oxygen excess was gradually eliminated by altering the domain boundary length, orientation, and atomic structure. The films nevertheless remained O-rich, with numerous terminal oxygen atoms (formation of MoO groups), and an elevated work function. Second, multiple ordered O-lean phases were formed, characterized by either very few or no terminal oxygen atoms, and a much smaller surface work function. According to calculations, the positive charging of the Pd substrate stabilizes the oxygen excess during the first stage, but during the second reduction stage, the substrate becomes negatively charged, stabilizing enhanced cation oxidation states. On their basis, the mechanisms underlying the oxygen release from the initial c(2 × 2) domains were disclosed. The experiments showed that the film reduction is perfectly reversible, which highlights the very promising properties of the MoO3/Pd system for heterogeneous catalysis.
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