等离子体子
材料科学
圆二色性
钼
非线性光学
光电子学
非线性光学
耐火材料(行星科学)
光学
非线性系统
纳米技术
结晶学
物理
化学
复合材料
激光器
量子力学
冶金
作者
Peng Yu,Tianji Liu,Xiaoyong Xu,Feng Lin,Shuai Yue,Junichi Takahara,Tao Ding,Hongxing Xu,Alexander O. Govorov,Zhiming M. Wang
出处
期刊:ACS Nano
[American Chemical Society]
日期:2025-05-17
标识
DOI:10.1021/acsnano.5c05694
摘要
Chiral plasmonic metasurfaces exhibit circular dichroism (CD) and serve as a key tool for chiroptics. However, in the linear optical regime, the CD value remains fixed. Moreover, conventional chiral plasmonic metasurfaces suffer from poor photothermal stability, making it difficult to excite their nonlinear optical properties. Here, we present a refractory plasmonic molybdenum (Mo) metasurface that not only maintains strong chiroptical effects under extreme conditions, withstanding temperatures up to 1100 °C and laser intensities exceeding 12 GW/cm2, but also realizes intensity-dependent tunable CD in the nonlinear optical region due to chiral saturated absorption and chiral reverse saturable absorption. In addition, our metasurface exhibits giant third-harmonic generation. Finally, we demonstrate a proof-of-concept circularly polarized light limiter based on this refractory chiral Mo metasurface.
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