多孔硅
扫描电子显微镜
蚀刻(微加工)
材料科学
傅里叶变换红外光谱
硅
光致发光
表面改性
红外光谱学
多孔性
分析化学(期刊)
沉积(地质)
化学工程
化学
纳米技术
光电子学
色谱法
复合材料
有机化学
图层(电子)
古生物学
沉积物
工程类
生物
作者
P. D. Jeyakumar,Sethuramachandran Thanikaikarasn,Balan Natarajan,T. Mahalingam,V. Ramadas,D. Eapen,P.J. Sebastián
标识
DOI:10.14447/jnmes.v18i4.354
摘要
The etching process of Porous Silicon has been carried out using an electrochemical oxidation technique. Oxidized samples were immobilized with -Leucine, DL-Iso Leucine and DL-Nor Leucine solutions. Surface morphology and optical properties of the samples have been analyzed using scanning electron microscopy and optical absorption analysis techniques respectively. The bonding characteristics on the surface before and after amino acid deposition have been studied using fourier transform infrared spectroscopy. Photoluminescence spectroscopy was employed to determine the enhancement in wavelength shift of the etched porous silicon.
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