Fabrication of ZnO Nanorods on Silicon Substrates by Sol-gel Hyrdothermal Methods

ZnO nanorods were deposited on silicon substrate using sol-gel hydrothermal methods. The seed layer was first grown by sol-gel methods and then annealed at temperatures of 300ºC, 400ºC, 500ºC and 600ºC. Multiple material and optical analyses including field-emission scanning electron microscope, energy dispersive X-ray spectroscopy, X-ray diffraction, photoluminescence spectra, and Raman spectra were conducted to examine the growth orientation and material properties. Results indicate that the ZnO nanorods annealed at a proper temperature of 400ºC could enhance orientation and material quality.