Fabrication of a holographic mask with high consistency for convex blazed grating

Abstract This study aimed to fabricate a holographic mask that can be developed to the bottom of the whole convex substrate and has the same groove depth, to meet the requirements of ion beam etching. The influence of light fields and exposure parameters on different positions of the photoresist substrate surface was studied. By comparing and analyzing the groove of holographic masks fabricated with different conditions, a holographic convex grating mask with high groove consistency can be obtained under the conditions of 40× light spot and 18 min exposure time. Finally, the high quality of the optimized holographic was verified by tests with ion beam etching.