High contrast patterning on glass substrates by 1064 nm pulsed laser irradiation

Patterning on glass substrates has been a promising technology for many applications, but it is difficult to make a high contrast pattern without chemical pollution. Glass substrates are basically transparent to 1064 nm laser irradiation and cannot be patterned directly by a 1064 nm pulsed laser. In this article, we report a new technique for laser patterning on glass substrates without damage. This technique has several advantages such as high contrast, high durability and low cost without rigorous experiment environment. By contacting the glass substrate with a graphite plate and using 1064 nm laser to irradiate at the interface, patterning is formed on the rear glass substrate. This method is based on the heating of graphite plate by laser. The confinement of glass substrates and strong absorption of graphite for an incident laser radiation provide the ambient of high local pressure and temperature, which make the graphite particles bond to the surface of glass, thus the purpose of making black color patterning of glass substrates can be achieved. Furthermore, various intricate patterns can be patterned on glass substrates.