氧化物
金属
材料科学
吸附
氧气
低能电子显微镜
化学物理
电子显微镜
化学工程
化学
物理化学
冶金
光学
物理
工程类
有机化学
作者
Guangwen Zhou,Langli Luo,Liang Li,Jim Ciston,Eric A. Stach,Judith C. Yang
标识
DOI:10.1103/physrevlett.109.235502
摘要
Using in situ atomic-resolution electron microscopy observations, we report observations of the oxide growth during the oxidation of stepped Cu surfaces. Oxidation occurs via direct growth of Cu(2)O on flat terraces with Cu adatoms detaching from steps and diffusing across the terraces. This process involves neither reconstructive oxygen adsorption nor oxygen subsurface incorporation and is rather different from the mechanism of solid-solid transformation of bulk oxidation that is most commonly postulated. These results demonstrate that the presence of surface steps can promote the development of a flat metal-oxide interface by kinetically suppressing subsurface oxide formation at the metal-oxide interface.
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