溶解
钝化
吸附
化学
金属
卤化物
无机化学
离子
铟
水溶液中的金属离子
动力学
汞齐(化学)
物理化学
电极
物理
量子力学
有机化学
图层(电子)
摘要
In acidic solutions , , and ions increase the true anodic dissolution rate of cadmium and of indium amalgam considerably. This is accounted for by the direct participation of these ions in elementary processes of ionizing metal atoms. The chemoadsorptive interaction of halide ions with surface atoms of a metal takes place at potentials much more negative than the dissolution potential of the metal. The extent of "filling" the surface with adsorbed anions increases considerably with shift of potential to more positive values. Some concepts are developed about the mechanism of dissolution of metal with direct participation of the solution components. These concepts explain both the dissolution rate acceleration by ions that specifically adsorb and the passivation of a metal surface by adsorbed oxygen from water.
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