Invitation to the World of the Plasma for Light Sources 4.Light Source for 21st Century 4.1 EUV (Extreme Ultra-Violet) Light Source

EUV lithography with a 13.5nm EUV (Extreme ultra-violet) light source is the strongest candidate of the next generation lithography for LSI. EUV is obtained from a high temperature and high density plasma by DPP (Discharge Produce Plasma) and LPP (Laser Produced Plasma).