Effect of lanthanide ions on the electrodeposition of cobalt and managanese oxides

镧系元素 化学 离子半径 无机化学 离子 氧化物 有机化学
作者
Yasumichi Matsumoto,Hideki Ohmura,Tetsuya Goto
出处
期刊:Journal of Electroanalytical Chemistry [Elsevier BV]
卷期号:399 (1-2): 91-96 被引量:16
标识
DOI:10.1016/0022-0728(95)04234-2
摘要

The effect of lanthanide ions such as La3+, Pr3+, Nd3+, Sm3+, Gd3+, Dy3+, Yb3+ and Y3+, on the electrodeposition of cobalt oxyhydroxide (CoOOH) and manganese oxide (MnO2) was investigated. All the lanthanide ions suppressed the electrodeposition of these compounds. The suppression effect was much stronger for the electrodeposition of CoOOH than for that of MnO2, and the amount of the incorporated lanthanide ion in the deposited film was higher for the former than for the latter. In the electrodeposition of CoOOH, the suppression effect increased with increasing amount of incorporated lanthanide ion in the deposited film in the order Yb3+>Y3+>Dy3+ >Gd3+ ≥ Sm3+ ≥ Nd3+ >Pr3+ >La3+. This order is almost the same as that of the decrease in the ionic radius. However, no clear dependence of the suppression effect on the type of lanthanide ion was observed for the electrodeposition of MnO2. It is assumed that the lanthanide ion is intercalated in the CoO layer of the CoOOH structure, but is only attached to the surface of the MnO2 during the electrodeposition. The relationship between the suppression effect and the state of incorporation of the lanthanide ion is discussed.

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