石墨烯
材料科学
电子迁移率
电极
电子束光刻
电子
光电子学
蚀刻(微加工)
阴极射线
电子传输链
图层(电子)
纳米技术
化学
抵抗
物理
生物化学
物理化学
量子力学
作者
Kirill I. Bolotin,Kenneth Sikes,Zhewei Jiang,Martin Klíma,Geoffrey Fudenberg,James Hone,Philip Kim,H. L. Störmer
标识
DOI:10.1016/j.ssc.2008.02.024
摘要
We have achieved mobilities in excess of 200,000 cm2 V −1 s−1 at electron densities of ∼2 ×1011 cm−2 by suspending single layer graphene. Suspension ∼150 nm above a Si/SiO2 gate electrode and electrical contacts to the graphene was achieved by a combination of electron beam lithography and etching. The specimens were cleaned in situ by employing current-induced heating, directly resulting in a significant improvement of electrical transport. Concomitant with large mobility enhancement, the widths of the characteristic Dirac peaks are reduced by a factor of 10 compared to traditional, nonsuspended devices. This advance should allow for accessing the intrinsic transport properties of graphene.
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