微型反应器
材料科学
基质(水族馆)
薄膜
异质结
纳米结构
纳米技术
平版印刷术
软光刻
制作
聚二甲基硅氧烷
沉积(地质)
化学工程
光电子学
催化作用
医学
生物化学
化学
替代医学
病理
古生物学
海洋学
沉积物
工程类
生物
地质学
作者
Zhongwei Gao,V. Vinay K. Doddapaneni,Changqing Pan,Rajiv Malhotra,Chih‐Hung Chang
标识
DOI:10.1002/adem.202401112
摘要
A novel, scalable process to deposit nanostructures with multiscale 3D geometric shapes and its application in fabricating p–n heterojunctions with n‐type ZnO and p‐type CuO is demonstrated. The process combines a microreactor‐assisted solution deposition with soft lithography to control and generate a chemical reactive flux that is transported by a patterned microfluidic channel for film printing. The precursor solutions are mixed and heated in a microreactor to generate reactive species controllably. Patterned polydimethylsiloxane (PDMS) channels guides the reacting solution to the substrate surface to form ZnO nanostructures with multiscale 3D geometric shapes. The channel geometry, flow rate, and substrate temperature are found to control the pattern geometry. A thin‐film diode composed of two different layers of a thin film with CuO at the bottom and ZnO at the top is fabricated to demonstrate fabrication of complicated functional nanostructures using low‐cost and facile solution‐based methods on desired substrate regions. The growth of the thin film can be controlled and accelerated compared to the traditional chemical bath deposition process, thanks to the continuous formation of the precursor solution with constant concentrations.
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