石墨烯
薄脆饼
材料科学
纳米技术
化学气相沉积
可扩展性
比例(比率)
计算机科学
物理
量子力学
数据库
作者
Bei Jiang,Shiwei Wang,Jingyu Sun,Zhongfan Liu
出处
期刊:Small
[Wiley]
日期:2021-06-09
卷期号:17 (37): e2008017-e2008017
被引量:33
标识
DOI:10.1002/smll.202008017
摘要
Abstract The availability of high‐quality, large‐scale, and single‐crystal wafer‐scale graphene films is fundamental for key device applications in the field of electronics, optics, and sensors. Synthesis determines the future: unleashing the full potentials of such emerging materials relies heavily upon their tailored synthesis in a scalable fashion, which is by no means an easy task to date. This review covers the state‐of‐the‐art progress in the synthesis of wafer‐scale graphene films by virtue of chemical vapor deposition (CVD), with a focus on main challenges and present status. Particularly, prevailing synthetic strategies are highlighted on a basis of the discussion in the reaction kinetics and gas‐phase dynamics during CVD process. Perspectives with respect to key opportunities and promising research directions are proposed to guide the future development of wafer‐scale graphene films.
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