X-ray reflectivity and photoelectron spectroscopy study of aluminum oxide thin film

Structural characterization and in-depth compositional analysis of aluminum oxide thin film is carried out using soft X-ray reflectivity (SXR) and X-ray photoelectron spectroscopy (XPS) techniques. XPS analysis confirms that the film is comprised of both AlOx and Al2O3 phases. In depth analysis of XPS data suggest that the AlOx phase is dominant in uppermost surface of the film while the stoichiometric oxide is dominant in depth.