材料科学
光电子学
异质结
响应度
光电探测器
范德瓦尔斯力
铁电性
极化(电化学)
纳米尺度
带隙
光致发光
光电导性
接口(物质)
机制(生物学)
纳米技术
半导体
宽禁带半导体
电子能带结构
量子效率
直接和间接带隙
作者
Xiangping Zhang,Kaizhen Liu,Zun-Yi Deng,Yinxin Bai,Gaocheng Wu,Shengyao Su,Hong-Hao Li,Guangtong Yuan,Wenjie Ming,Yingli Zhang,Changjian Li,Jiawang Hong,Jin-Hui Zhong,Junling Wang,Boyuan Huang
出处
期刊:Small
[Wiley]
日期:2025-11-21
卷期号:: e11782-e11782
标识
DOI:10.1002/smll.202511782
摘要
Abstract Van der Waals ferroelectrics/semiconductor heterostructures such as CuInP 2 S 6 (CIPS)/ MoS 2 hold promise for optoelectronics, yet their interfacial mechanisms remain poorly understood. Here, it is shown that type‐II band alignment at the CIPS/MoS 2 interface not ferroelectric polarization drives high performance. The gate‐free devices achieve a photocurrent‐to‐dark current ratio >10 4 , and a responsivity of 730 A·W −1 under low‐intensity visible illumination without pre‐poling. Inserting an h ‐BN spacer to eliminate direct band alignment sharply degrades device performance, confirming its essential role in enabling efficient photocarrier separation. Nanoscale measurements, photoluminescence quenching, bandgap narrowing, and first‐principles calculations all consistently support the presence and function of type‐II alignment. These results clarify the operating mechanism of CIPS/MoS 2 devices and offer guidance for interface engineering in 2D optoelectronic devices.
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