材料科学
极限抗拉强度
微观结构
铜
箔法
复合材料
粒度
电镀
冶金
拉伸试验
产量(工程)
机械强度
铜合金
航程(航空)
作者
Fu-Chian Chen,Dinh-Phuc Tran,Chih Chen
出处
期刊:Materials
[Multidisciplinary Digital Publishing Institute]
日期:2025-12-21
卷期号:19 (1): 36-36
摘要
This study systematically investigates the thickness-dependent mechanical properties of electroplated copper foils with fine-grained (FG-Cu) and columnar nanotwinned (NT-Cu) microstructures. Tensile testing across a thickness range of 5-30 μm revealed that NT-Cu exhibits superior mechanical stability, with significantly lower reductions in both ultimate tensile strength (UTS) and yield strength (YS) compared to FG-Cu. The UTS of the 30 μm thick FG-Cu foil was measured at 651 MPa, increasing to 792 MPa at a thickness of 5 μm. In contrast, the UTS of NT-Cu foils only rose from 624 MPa at 30 μm to 663 MPa at 5 μm. A similar trend was observed for the YS. Microstructural analysis confirmed that NT-Cu maintains a stable columnar grain structure with minimal grain growth, contributing to its resistance to thickness-induced strength loss. These findings highlight NT-Cu as a promising candidate for applications requiring consistent mechanical performance across varying foil thicknesses.
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