Magnetorheological fluid circulation system structure under the condition of small flow rate in magnetorheological polishing

磁流变液 材料科学 抛光 控制理论(社会学) 机械 机械工程 流量(数学) 工程类 计算机科学 控制工程 阻尼器 复合材料 物理 控制(管理) 人工智能
作者
Caixue Tang,Shenglin Wen,Yuanhang Zhang,Hao Yan
出处
期刊:Seventh Symposium on Novel Photoelectronic Detection Technology and Applications 卷期号:: 405-405 被引量:1
标识
DOI:10.1117/12.2587612
摘要

Magnetorheological polishing technology is a new type of ultra-precision processing technology. It has many advantages such as no sub-surface defects, easy realization of numerical precision control, high machining accuracy, and high polishing efficiency; and its small removal function size makes it very suitable for processing optical elements with complex geometric structures. It has been widely used in phase optical processing. In order to realize the processing of phase optical elements with a small space periodic structure, a smaller removal function is required. The traditional magnetorheological fluid circulation system structure is difficult to achieve stable control of the magnetorheological fluid flow under small flow conditions. Therefore, it is difficult to obtain a stable small size removal function. This paper analyzes the characteristics of the peristaltic pump, and aiming at the problem of strong pulse in its output flow; uses a pulsation damper and a variable-diameter back pressure pipeline to eliminate the flow pulse, realizes the stable and smooth output of the peristaltic pump flow. On this basis, this paper proposes a new type of magnetorheological fluid circulation system structure, which realizes the stable control of the flow rate under small flow rate conditions. The magnetorheological fluid flow fluctuation error of the magnetorheological fluid circulation system was from more than 25% reduced to less than 2%, realizing high stability control of magnetorheological fluid flow. Use small size removal function to process Continuous Phase Plates (CPP) with large depth and small periodic structure. The CPP is designed with a PV of 5μm and a minimum space period of 3mm. After processing, the residual error RMS of the CPP from 830nm converges to 24.5nm, realize high-precision processing of phase components with large depth and small structure.
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