铜
被动性
介电谱
材料科学
电化学
动能
分析化学(期刊)
极化(电化学)
硼
电阻抗
化学
热力学
冶金
电极
物理化学
物理
电气工程
色谱法
有机化学
工程类
量子力学
作者
Feixiong Mao,Yuting Zhou,Chaofang Dong,Digby D. Macdonald
标识
DOI:10.1002/maco.202213405
摘要
Abstract The passivity of pure copper over a wide pH range has been explored using potentiodynamic and potentiostatic polarization, Mott–Schottky analysis, and electrochemical impedance spectroscopy (EIS). The study shows that the passive film is a p‐type semiconductor. The natural logarithm of the passive current density is found to linearly increase with the film formation potential. The passive state of copper is interpreted by optimizing the point defect model (PDM) on the EIS data. Kinetic stability diagrams are derived for pure copper in borate buffer based on the rate law for passive film growth in accordance with the PDM.
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