Continuous-flow titration of low iron doses to promote photo-Fenton and photo-Fenton-like processes at neutral pH

化学 过硫酸盐 滴定法 环境化学 核化学 无机化学 生物化学 催化作用
作者
Carla S. Santos,Miguel A. Herráiz,Engracia Lacasa,Cristina Sáez,Rosa Montes,José Benito Quintana,Rosario Rodil,Ana I. Gomes,Vítor J.P. Vilar
出处
期刊:Chemical Engineering Journal [Elsevier BV]
卷期号:476: 146655-146655 被引量:9
标识
DOI:10.1016/j.cej.2023.146655
摘要

Photo-Fenton (PF) is a promising process for degrading a wide range of contaminants of emerging concern (CECs) present in urban wastewater (UWW) after secondary treatment, mitigating their spread in aquatic systems. However, the near-neutral pH of UWW poses a challenge to PF performance. In this research, a tubular membrane photoreactor, designed for continuous “titration” of Fe2+, is explored to promote the PF process for the tertiary treatment of UWW. The application of persulfate (PF-like) as an alternative oxidant and the impact of phosphate (PO43−) content in UWW were also assessed. Process efficiency was evaluated in continuous mode, applying low residence times (RT: 6.1, 36.6, and 73.2 s) and low Fe2+ doses (1, 2, and 5 mg L−1), for the oxidation of 19 CECs (each spiked at 10 µg/L), in demineralized water (DW) and secondary-treated UWW. Despite the persistence of certain short-chain perfluoroalkyl substances (PFAS) and saccharine across all conditions tested, the PF-like process exhibited superior performance when compared with PF, attaining higher removals for most target CECs, especially for melamine. In UWW, for an RT = 73.2 s, [Fe2+] = 5 mg L−1, and [oxidant] = 1.2 mM, PF process removed 7 CECs > 60 % and PF-like 10 CECs > 60 %. Moreover, higher residual concentrations of Fe2+ and lower precipitation of PO43− were observed for PF-like treatments, evidencing its advantages for tertiary treatment. These results emphasize the importance of photoreactor design to achieve efficient PF/PF-like at neutral pH, avoiding the use of chelating agents while managing iron concentrations compatible with UWW discharge or reuse limits.
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