卤化物
结晶度
锡
结晶
薄膜晶体管
材料科学
钙钛矿(结构)
电子迁移率
氯化物
碘化物
微晶
无机化学
光电子学
化学工程
纳米技术
化学
复合材料
冶金
图层(电子)
工程类
作者
Hyukhyun Ryu,Youjin Reo,W.S. Park,Dong‐Hyeon Lee,Hamin Choi,S. S. Yoo,Ao Liu,Huihui Zhu,Yong‐Young Noh
标识
DOI:10.1002/sstr.202500055
摘要
Tin (Sn 2+ )‐based halide perovskites have emerged as promising lead‐free alternatives for high‐performance thin‐film transistors (TFTs) due to their low toxicity and excellent hole transport properties. However, difficult control over their rapid film crystallization hinders the device performance and yield. Herein, the incorporation of chloride additives, particularly methylammonium chloride (MACl), into phenethylammonium tin iodide (PEA 2 SnI 4 ), effectively modulates the crystallization process by forming intermediate complexes within the precursor solution and the film, fabricating large crystallites with minimized defects. The enhanced film quality contributes to efficient charge transport in the channel layers of TFT, where optimized MACl‐PEA 2 SnI 4 TFTs exhibit up to a threefold increase in field‐effect mobility and a substantial enhancement in the on/off current ratio. The chloride additive engineering can effectively address the fundamental issues of rapid crystallization in Sn 2+ ‐based perovskites, providing deeper insights into efficient film quality modulation and charge transport efficiency for electronic applications.
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