Phonon thermal transport in two-dimensional gallium nitride: Role of higher-order phonon–phonon and phonon–electron scattering

声子 凝聚态物理 散射 材料科学 氮化镓 声子散射 表面声子 物理 光学 纳米技术 图层(电子) 冶金
作者
J. R. Sun,Xiangjun Liu,Yucheng Xiong,Yuhang Yao,Xiaolong Yang,Cheng Shao,Renzong Wang,Shouhang Li
出处
期刊:Applied Physics Letters [American Institute of Physics]
卷期号:126 (11)
标识
DOI:10.1063/5.0256246
摘要

Two-dimensional gallium nitride (2D-GaN) has great potential in power electronics and optoelectronics. Heat dissipation is a critical issue for these applications of 2D-GaN. Previous studies have shown that higher-order phonon–phonon scattering has extremely strong effects on the lattice thermal conductivity (κlat) of 2D-GaN, with the fourth-order interatomic force constants (4th-IFCs) calculated using experienced atomic displacement in the finite difference method. In this work, it is found that the 4th-IFCs of 2D-GaN are quite sensitive to atomic displacement in the finite difference method. The effects of the four-phonon scattering can be severely overestimated with non-convergent 4th-IFCs. The κlat from three-phonon scattering is reduced by 65.6% due to four-phonon scattering. The reflection symmetry allows significantly more four-phonon processes than three-phonon processes. It was previously thought the electron–phonon interactions have significant effects on the κlat of two-dimensional materials. However, the effects of electron–phonon interactions on the κlat of both n-type and p-type 2D-GaN at high charge carrier concentrations can be neglected due to the few phonon–electron scattering channels and the relatively strong four-phonon scattering.
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