纳米压印光刻
材料科学
聚合物
抵抗
分子动力学
平版印刷术
纳米光刻
纳米技术
纵横比(航空)
连续介质力学
空腔壁
复合材料
机械
光电子学
化学
计算化学
物理
制作
图层(电子)
医学
替代医学
病理
作者
Masaaki Yasuda,Kosei Araki,Akihiro Taga,Akira Horiba,Hiroaki Kawata,Yoshihiko Hirai
标识
DOI:10.1016/j.mee.2011.01.016
摘要
The pattern geometry dependence of the resist-filling process in nanoimprint lithography is studied with molecular dynamics and continuum mechanics simulations. When the cavity size becomes smaller than the molecular size of the polymer, the filling ratio of the cavity becomes quite low in MD simulation. This polymer-size effect is not seen in continuum mechanics. The filling ratio of the cavity decreases with increase in neighboring cavity size. The influence of the cavity size is larger than that of the cavity position in the polymer filling process. We also demonstrate typical examples of the movement of the polymer molecule during the filling process.
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