One‐Step Radical‐Intensified Selective Etching (RISE) Strategy for High‐Yield Synthesis of Monolayer MXene with Tailored Nanoholes

in capacitive deionization, outperforming most pure MXene-based electrode materials. Our method can potentially revolutionize the prevailing wet chemical etching protocol used for a decade for yielding monolayer MXene and establishes a swift pathway toward customizable MXene architectures for energy and environmental applications.