材料科学
光电子学
硅
工程物理
钝化
光伏系统
纳米技术
电气工程
工程类
图层(电子)
作者
Stefan W. Glunz,Martin Hermle,Christian Reichel,Martin Bivour,Frank Feldmann
出处
期刊:Fraunhofer-Gesellschaft - Fraunhofer-Publica
[Fraunhofer-Gesellschaft]
日期:2013-01-01
卷期号:: 988-992
被引量:42
标识
DOI:10.4229/28theupvsec2013-2co.4.4
摘要
Due to the improvements in material quality and surface passivation, high-efficiency solar cells are often limited by the recombination at the metal semiconductor contacts. As a solution to this problem, Swanson proposed “to put a heterojunction with a band-gap larger than silicon between the metal and silicon”[1] also known as passivated contact. In this work, a tunnel oxide passivated contact (TOPCon) structure allowing both an excellent surface passivation and an effective carrier transport is presented. High-efficiency n-type solar cells featuring this novel passivated rear contact instead of a point contact structure at the rear side yield a maximum efficiency of 23.7 %, a FF of 82.2 % and a Voc of 703 mV.
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