Understanding and Mitigating the Degradation of Perovskite Solar Cells Based on a Nickel Oxide Hole Transport Material during Damp Heat Testing

材料科学 钙钛矿(结构) 潮湿 降级(电信) 氧化镍 氧化物 纳米技术 化学工程 冶金 电子工程 热力学 物理 工程类
作者
Marion Dussouillez,Soo‐Jin Moon,Mounir Mensi,Christian M. Wolff,Yongpeng Liu,Jun‐Ho Yum,Brett A. Kamino,Arnaud Walter,Florent Sahli,Ludovic Lauber,Gabriel Christmann,Kevin Sivula,Quentin Jeangros,Christophe Ballif,Sylvain Nicolay,Adriana Paracchino
出处
期刊:ACS Applied Materials & Interfaces [American Chemical Society]
卷期号:15 (23): 27941-27951 被引量:24
标识
DOI:10.1021/acsami.3c02709
摘要

The development of stable materials, processable on a large area, is a prerequisite for perovskite industrialization. Beyond the perovskite absorber itself, this should also guide the development of all other layers in the solar cell. In this regard, the use of NiO x as a hole transport material (HTM) offers several advantages, as it can be deposited with high throughput on large areas and on flat or textured surfaces via sputtering, a well-established industrial method. However, NiO x may trigger the degradation of perovskite solar cells (PSCs) when exposed to environmental stressors. Already after 100 h of damp heat stressing, a strong fill factor (FF) loss appears in conjunction with a characteristic S-shaped J–V curve. By performing a wide range of analysis on cells and materials, completed by device simulation, the cause of the degradation is pinpointed and mitigation strategies are proposed. When NiO x is heated in an air-tight environment, its free charge carrier density drops, resulting in a band misalignment at the NiO x /perovskite interface and in the formation of a barrier impeding hole extraction. Adding an organic layer between the NiO x and the perovskite enables higher performances but not long-term thermal stability, for which reducing the NiO x thickness is necessary.
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