材料科学
钙钛矿(结构)
潮湿
降级(电信)
氧化镍
氧化物
镍
纳米技术
化学工程
冶金
电子工程
热力学
物理
工程类
作者
Marion Dussouillez,Soo‐Jin Moon,Mounir Mensi,Christian M. Wolff,Yongpeng Liu,Jun‐Ho Yum,Brett A. Kamino,Arnaud Walter,Florent Sahli,Ludovic Lauber,Gabriel Christmann,Kevin Sivula,Quentin Jeangros,Christophe Ballif,Sylvain Nicolay,Adriana Paracchino
标识
DOI:10.1021/acsami.3c02709
摘要
The development of stable materials, processable on a large area, is a prerequisite for perovskite industrialization. Beyond the perovskite absorber itself, this should also guide the development of all other layers in the solar cell. In this regard, the use of NiO x as a hole transport material (HTM) offers several advantages, as it can be deposited with high throughput on large areas and on flat or textured surfaces via sputtering, a well-established industrial method. However, NiO x may trigger the degradation of perovskite solar cells (PSCs) when exposed to environmental stressors. Already after 100 h of damp heat stressing, a strong fill factor (FF) loss appears in conjunction with a characteristic S-shaped J–V curve. By performing a wide range of analysis on cells and materials, completed by device simulation, the cause of the degradation is pinpointed and mitigation strategies are proposed. When NiO x is heated in an air-tight environment, its free charge carrier density drops, resulting in a band misalignment at the NiO x /perovskite interface and in the formation of a barrier impeding hole extraction. Adding an organic layer between the NiO x and the perovskite enables higher performances but not long-term thermal stability, for which reducing the NiO x thickness is necessary.
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