A study of structural effects on the focusing and imaging performance of hard X-rays with 20–30 nm zone plates

波带板 倍半硅氧烷氢 光学 菲涅耳区 材料科学 图像分辨率 制作 镜头(地质) 菲涅耳透镜 分辨率(逻辑) 量子效率 光电子学 物理 纳米技术 电子束光刻 抵抗 衍射 病理 人工智能 医学 替代医学 图层(电子) 计算机科学
作者
Xujie Tong,Vishal Dhamgaye,Qiucheng Chen,Qingxin Wu,Biao Deng,Ling Zhang,Oliver Fox,Hongchang Wang,Jun Zhao,Yifang Chen,Zijian Xu,Peng Li,Kawal Sawhney
出处
期刊:Journal of Synchrotron Radiation [Wiley]
卷期号:31 (6): 1457-1463 被引量:1
标识
DOI:10.1107/s1600577524009615
摘要

Hard X-ray microscopes with 20–30 nm spatial resolution ranges are an advanced tool for the inspection of materials at the nanoscale. However, the limited efficiency of the focusing optics, for example, a Fresnel zone plate (ZP) lens, can significantly reduce the power of a nanoprobe. Despite several reports on ZP lenses that focus hard X-rays with 20 nm resolution – mainly constructed by zone-doubling techniques – a systematic investigation into the limiting factors has not been reported. We report the structural effects on the focusing and imaging efficiency of 20–30 nm-resolution ZPs, employing a modified beam-propagation method. The zone width and the duty cycle (zone width/ring pitch) were optimized to achieve maximum efficiency, and a comparative analysis of the zone materials was conducted. The optimized zone structures were used in the fabrication of Pt-hydrogen silsesquioxane (HSQ) ZPs. The highest focusing efficiency of the Pt-HSQ-ZP with a resolution of 30 nm was 10% at 7 keV and >5% in the range 6–10 keV, whereas the highest efficiency of the Pt-HSQ-ZP with a resolution of 20 nm was realized at 7 keV with an efficiency of 7.6%. Optical characterization conducted at X-ray beamlines demonstrated significant enhancement of the focusing and imaging efficiency in a broader range of hard X-rays from 5 keV to 10 keV, demonstrating the potential application in hard X-ray focusing and imaging.
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