Survey on Roller-type Nanoimprint Lithography (RNIL) Process

Nanoimprint Lithography has been demonstrated as a high-throughput, high-resolution and low-cost manufacturing method on nano scale pattering since it was first proposed by Dr. S.Y. Chou in 1995. In this article we presented a general literature review on the Roller-type Nanoimprint Lithography (RNIL), a continuous nanoimprint lithography process. Several kinds of typical Roller-type Nanoimprint Lithography process have been briefly introduced and some examples are also introduced to gain a clear general view and perceive.