材料科学
电容器
肖特基势垒
铁电性
电极
电介质
欧姆接触
图层(电子)
薄膜
肖特基二极管
光电子学
复合材料
纳米技术
电压
电气工程
化学
物理化学
二极管
工程类
作者
Takashi Nozaka,Yoichiro Masuda
出处
期刊:Ferroelectrics
[Taylor & Francis]
日期:2007-09-28
卷期号:357 (1): 276-282
被引量:4
标识
DOI:10.1080/00150190701545581
摘要
The crystalline defects of electrode/ferroelectric interface of PZT thin film capacitors with Pt, IrO 2 and SrRuO 3 (SRO) top electrodes were investigated by TEM-EDX analysis. The interface of Pt/PZT and IrO2/PZT had an ideal interface structure, and formed good Schottky barriers. However, the Schottky barrier was not formed at the SRO/PZT interface. Because Ru diffused into the PZT surface, and this joint like Ohmic contact was formed. Moreover, a Sr-rich SRO layer of about 10 nm existed in interfacial neighborhood. This alteration layer influenced dielectric dispersion, and caused a remarkable bias dependency for the C-V characteristics.
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