阈下传导
纳米尺度
频道(广播)
场效应晶体管
材料科学
阈下斜率
双闸门
栅氧化层
兴奋剂
晶体管
光电子学
纳米技术
物理
MOSFET
计算机科学
电信
量子力学
电压
作者
Xiaoshi Jin,Xi Liu,Meile Wu,Rongyan Chuai,Jung‐Hee Lee,Jong‐Ho Lee
标识
DOI:10.1088/0022-3727/45/37/375102
摘要
Abstract An analytical subthreshold current of deep nanoscale short channel junctionless field-effect transistors (JL FETs) with a symmetric double-gate (DG) structure has been proposed. It is derived from two-dimensional Poisson's equation using a variable separation technique. The proposed models can exactly describe the behaviour of subthreshold I – V characteristics with nanoscale channel length without any empirical fitting parameter. The model accounts for channel length, body thickness, gate oxide thickness and body doping concentrations. The models are verified by comparison with TCAD simulations and show good agreement.
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