材料科学
兴奋剂
钻石
压力(语言学)
化学气相沉积
工程物理
复合材料
纳米技术
光电子学
物理
语言学
哲学
出处
期刊:Chinese Physics
[Science Press]
日期:2007-01-01
卷期号:56 (6): 3428-3428
被引量:7
摘要
Sulphur-doped and boron-sulphur co-doped diamond thin films were prepared using chemical vapour deposition (CVD) on Si substrates under different conditions. The influence of doping on stress in CVD diamond films were investigated with X-ray diffraction and Raman spectra. The results show that the sp2-carbon content, the concentration of defects and the residual compressive stress in CVD diamond films increase with increasing of sulphur content. Compared with sulphur doping of diamond films, the boron-sulphur co-doping with few boron atoms facilitates sulphur atom incorporation into diamond crystal. The boron-sulphur complexes in diamond can reduce crystal lattice distortion and crystal imperfection. As a result, sp2-carbon content and residual compressive stress in boron-sulphur co-doped diamond are reduced, and diamond crystal prefection is improved.
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