宽带
材料科学
相(物质)
光电子学
相变
凝聚态物理
化学
光学
物理
有机化学
作者
Kaixiang Liu,J. F. Tang,Lidong Dai,Yuxue Yang,Wen Liang,Shengyun Luo,Guang peng Luo,J. Y. Zhang,Qinghong Li,Tengfei Wang,Rongrong Wang,Jialiang Dong,Yong Meng,Gtiangning Liu
摘要
This work investigates the pressure-dependent structural evolution and optoelectronic behavior of MoO3 under high pressure to 37.8 GPa, combining in situ Raman spectroscopy, x-ray photoelectron spectroscopy, photocurrents, electrical conductivity, and theoretical calculations. Two distinct phase transitions in α-MoO3 were observed: first to the MoO3-II phase at about 10.1 GPa, followed by conversion to the high-pressure MoO3-III phase at about 25.3 GPa. This structural evolution correlated with exceptional optoelectronic enhancement, demonstrating a 434-fold increase in the photocurrent density (from 0.0628 to 29.10 mA cm−2) and the corresponding responsivity (from 1.366 to 632.7 mA W−1) under 365 nm illumination at 37.8 GPa, relative to the corresponding values at 1.2 GPa. These enhancements arise from pressure-induced increases in electrical conductivity, bandgap narrowing, and improved light absorption. Notably, the high-pressure MoO3-II and MoO3-III phases exhibit photodetection extending into the near-infrared band (980 nm). These anomalous phenomena can be attributed to the formation of oxygen vacancies, which introduce in-gap states positioned below the conduction band minimum, thereby facilitating efficient carrier excitation across both visible and infrared spectral regions. The findings highlight high-pressure engineering as an effective approach to optimize the optoelectronic performance of MoO3, advancing its potential utility in photodetector systems.
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