共栅
高电子迁移率晶体管
材料科学
光电子学
MOSFET
氮化镓
电压
电气工程
宽禁带半导体
电子工程
晶体管
工程类
CMOS芯片
纳米技术
图层(电子)
放大器
作者
Ji Shu,Jiahui Sun,Zheyang Zheng,Kevin J. Chen
标识
DOI:10.1109/tpel.2024.3365065
摘要
The high reverse-recovery charge ( Qrr ) of the Si superjunction (SJ) mosfet s’ body diode leads to exacerbated switching loss and even destructive dynamic avalanche. In this article, we propose a GaN/Si-SJ cascode structure that combines the high-voltage Si SJ- mosfet s with a low-voltage GaN HEMT. Benefiting from introducing GaN HEMT, the GaN/Si-SJ cascode structure features zero Qrr at moderate current levels and substantially suppressed Qrr at high current levels. Such a significant improvement in the reverse-recovery process leads to a more than 50% reduction in switching loss and significantly enhanced hard-commutation robustness simultaneously.
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