Effects of Plasma Ions/Radicals on Kinetic Interactions in Nanowall Deposition: A Review

Recent advances in the growth of carbon nanowalls (CNWs) and vertical graphene nanosheets using various plasma‐enhanced chemical vapor deposition (PECVD) methods are reviewed in this article. Growth methods are classified into hot‐ and cold‐wall reactors equipped with diverse plasma generation systems, and their respective characteristics are summarized, with particular attention to the behavior of reactive species, such as ions and radicals, generated within the plasma. Recent progress in this research domain is outlined for each method, and an organized account of the chemical kinetic phenomena occurring within the plasma is provided. Finally, future perspectives are discussed. Fundamental data are obtained through real‐time in situ measurements of ions and radicals, and the construction of a database from these data offers microscopic insights that significantly enhance processing outcomes for macroscopically controlling the mechanical shapes and chemical properties of CNWs.