Observation of threading dislocations and misfit dislocation half-loops in GaN/AlGaN heterostructures grown on Si using electron channeling contrast imaging

We implemented invisibility criterion and black–white contrast orientation analysis into low-tilt electron channeling contrast imaging (ECCI) for dislocation-type discrimination in GaN and AlGaN layers grown on a Si(111) substrate. Our ECCI and x-ray diffraction (XRD) analysis attained consistent threading dislocation densities for GaN and AlGaN grown on Si, but demonstrated drastic discrepancy in the percentage of edge-type dislocations, potentially due to the lack of appropriate consideration of mixed-type (a→+c→) dislocations in XRD. Further ECCI analysis of GaN/AlGaN heterointerface revealed mixed-type (a→+c→) dislocation half-loops and dislocation bending due to compressive strain relaxation, validating that not all the dislocations originated from the mosaic or columnar structure. As a result, XRD analysis based on the mosaic block model does not give reliable edge-to-screw dislocation ratio. The observation of classic van der Merwe–Matthews-type dislocation half-loop nucleation and dislocation gliding could be associated with potential GaN/AlGaN optoelectronic device degradation issues.