Self-Inspection for Defect Detection in Photomask Image

This paper describes a new method for the process of extracting photomask defects using a single optical photomask image which is not aligned. The lines of a photomask picture are not parallel with the pixel grid, and so there is always a angle of error. Only one sample image which contains defects was used in our tests. The algorithm is effective because we only need one sample photomask image. It not only extracts general patterns of photomask defects but also relatively small and discontinuous patterns.